Infrared Lens

Infrared Lens

Ultraopto infrared lenses are compatible with the full range of near-infrared, mid-infrared, and far-infrared bands, featuring high-quality substrates such as fused silica, silicon, germanium, and zinc selenide, combined with precision optical processing and customized coating processes, offering excellent optical transmission performance, high laser damage threshold, and precise surface shape control. It is widely used in infrared laser processing, infrared imaging, industrial laser systems, scientific research laser devices and other fields, providing highly reliable core equipment for all kinds of infrared optical systems.

 

Ultraopto can precisely customize lens parameters and processes according to customer application scenarios, and provide one-to-one technical connection throughout the entire process to match personalized demands.

 

Core product advantages

1.Full spectrum high transmittance:   

Customized anti-reflection coating for near/mid/far infrared bands, with low absorption and minimal scattering, significantly enhancing infrared light transmission efficiency


2.High damage resistance and long life: 

High-purity substrate selection + precision processing + advanced post-treatment effectively suppresses subsurface damage, withstanding strong laser irradiation, suitable for industrial-grade long-term working conditions


3.Precision surface shape control : 

Full-process high-precision detection, excellent surface shape and transmission wavefront accuracy, reduced wavefront distortion, ensuring laser collimation and focusing accuracy


4.Strict quality control: 

Full-dimensional performance testing, high consistency of product parameters, suitable for stable operation in multiple scenarios such as research and industry


5.Flexible customization: 

Supports customization of base, size, optical parameters, and additional processes to precisely match customer system requirements

 

Infrared Lens Core Parameter table

Adapted    bands

Near    infrared (808 nm / 980 nm / 1064 nm / 1550 nm)

Mid-infrared    (3μm/4μm)

Far-infrared    (10.6μm)

Recommended   Substrate material

Fused   quartz/single crystal silicon

Germanium   (Ge)/ Silicon (Si

Zinc   selenide (ZnSe)

Central   wavelength transmittance

99.0%

98.5%

98.0%

Surface   finish

20-10   scratch-dig

20-10   scratch-dig

40-20   scratch-dig

Aperture   for light passage

95%

95%

90%

Transmitted   wavefront @633nm

PV   lambda 1/8 or less

PV   lambda 1/8 or less

PV   lambda 1/6 or less

Laser   damage threshold

5J/cm² (pulse 1-on-1)

100MW/cm² (continuous S-on-1)

3J/cm² (pulse 1-on-1)

50MW/cm² (continuous S-on-1)

2J/cm² (pulse 1-on-1)

30MW/cm² (continuous S-on-1)

Coating   process

Electron   beam evaporation/magnetron sputtering anti-reflection coating

Double   ion beam sputtering anti-reflection coating

Magnetron   sputtering anti-reflection coating

Typical   applications

Laser   processing, fiber laser systems, infrared detection

Infrared   temperature measurement, laser distance measurement

Laser   cutting, infrared imaging

 

Customized services

Support optical parameters, size specifications, process matching customization, core customization scope:


Optical parameters: 

focal length, radius of curvature, numerical aperture (NA), transmitted wavefront accuracy


Size specifications: 

Circular/square (φ5 to φ200mm/5×5 to 150×150mm), thickness, irregular structure 


Additional processes: 

Chamfering (C0.2 - C1.0mm), enhanced edge, surface modification, vacuum clean packaging

 

Quality inspection

Equipped with a full set of inspection equipment including Zygo interferometer, CRD high reflectance tester, VHX-7000 microscope, etc., full-dimensional inspection of core indicators such as lens ** transmittance, surface shape accuracy, surface quality, film weak absorption, temperature rise, laser damage threshold ** is carried out to ensure product performance meets the standards.


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