Ultraopto infrared laser window film
Suitable for the full range of near/mid/far infrared, selects high-quality substrates such as fused silica, silicon, germanium, zinc selenide, etc., customizes anti-reflection coating with strong adhesion, resistant to strong laser irradiation and environmental corrosion, widely used in infrared laser processing, infrared imaging, laser ranging, industrial laser systems, etc. It provides efficient protection for infrared laser transmission and supports full-dimensional parameter customization.
Ultraopto can precisely customize laser Windows based on customer application scenarios, one-to-one technical connection throughout the entire process, and match personalized demands.
Core Advantage
1. High transmittance across the entire band, low absorption and low scattering of the film layer, high infrared light transmission efficiency
2 Resistant to damage and wear, high laser damage threshold, resistant to long-term intense laser irradiation
3. Strong material compatibility, select the base according to the band, taking into account both optical performance and mechanical strength
4. Mature process, high surface accuracy, strong environmental adaptability, and stable use in complex working conditions
Infrared Laser Window Sheet Core Parameters Table
Adapted bands | Recommended base material | Central wavelength transmittance | Surface finish | Aperture of light passage | Laser damage threshold | Coating process | Typical applications |
Near-infrared (808/980/1064/1550nm) | Fused quartz/single crystal silicon | ≥99.0% | 20-10 scratch-dig | ≥95% | Pulse ≥5J/cm² (1-on-1) Continuous ≥100MW/cm² (S-on-1) | Electron beam evaporation/magnetron sputtering anti-reflection films | Laser processing, fiber laser systems |
Mid-infrared (3/4μm) | Germanium (Ge)/ silicon (Si) | ≥98.5% | 20-10 scratch-dig | ≥95% | Pulse ≥3J/cm² (1-on-1) Continuous ≥50MW/cm² (S-on-1) | Double ion beam sputtering anti-reflection film | Infrared temperature measurement, laser distance measurement |
Far-infrared (10.6μm) | Zinc selenide (ZnSe | ≥98.0% | 40-20 scratch-dig | ≥90% | Pulse ≥2J/cm² (1-on-1) Continuous ≥30MW/cm² (S-on-1) | Magnetron sputtering anti-reflection film | Laser cutting, infrared imaging equipment |
Custom range
Size specifications:
Round φ5 to φ200mm/ square 5×5 to 150×150mm, thickness 1 to 20mm
Process customization:
Chamfering, surface hydrophobic/hydrophilic modification, vacuum clean packaging, special band coating
Material customization:
Select the base according to the requirements of the working conditions, taking into account both optical performance and mechanical protection
