193nm Fused Silica Window

Coning 7980-ARF grade

Customized 193nm ultraviolet fused quartz window plates are available. Different sizes can be customized as per customer  requirements. One piece is the minimum order quantity. Discounts are offered for large quantities.

UItraopto Precision Optics Co. Ltd 193nm ultraviolet fused quartz window plates have laser-level surface quality and parallelism, and can limit the transmission wavefront distortion to λ/10. The ultra-high transmittance is over 98% at 193nm. They are  suitable for ArF excimer laser applications.

Wafer defect detection: 

193nm laser can distinguish smaller wafer surface defects. The high transmittance window plates are used for detecting the sealing and protection of the optical path.

Deep ultraviolet spectroscopy analysis: 

In the fields of materials science and chemical analysis, 193nm deep ultraviolet spectroscopy is used to analyze the electronic structure and chemical bond characteristics of materials.

Laser cavity mirror protection window: 

In the resonator of ArF excimer laser, the window plate can be used to protect the high-reflection cavity mirror and prevent it from being contaminated by plasma or impurities produced during the discharge process of the laser.

Laser processing and micro-nano manufacturing: 

193nm laser can be used for high-precision micro-nano processing.

UItraopto Precision Optics Co. Ltd can provide various laser/protective/view window plates made of different quartz materials. Special sizes and materials can be customized according to customer requirements, including single-layer or multi-layer anti-reflection coated optical windows.

UItraopto Precision Optics Co. Ltd can provide stable products through precise control of polishing, coating processes, and bonding processes, and accepts customized window plates of various specifications.

Ultraopto’s 193nm Fused Silica Window is a high-precision deep UV optical component specifically optimized for 193nm ArF excimer laser applications, serving as a core part in semiconductor lithography tools, deep UV laser systems and high-precision optical measurement equipment. Crafted from premium grade 193nm-specific fused silica (JGS1) with extremely low metallic impurity levels (below 1ppm) and minimal OH⁻ content, our window delivers exceptional transmittance exceeding 90% at 193nm wavelength, minimizing light absorption and energy loss for critical deep UV applications. The material’s high optical homogeneity and low refractive index variation (below ±1×10⁻⁶) ensure consistent optical performance across the entire window aperture, avoiding light distortion and ensuring precise beam delivery in high-precision systems.

Manufactured with advanced ultra-precise polishing and cleaning processes tailored for deep UV applications, our 193nm Fused Silica Window achieves superior surface quality with a scratch-dig rating as fine as 10-5 and ultra-strict flatness control (<λ/10 @633nm), reducing light scattering and wavefront distortion to meet the stringent requirements of semiconductor lithography and high-power laser systems. The window features tight dimensional tolerance control and excellent parallelism (<1 arc minute), ensuring seamless integration into complex optical assemblies and compatibility with standard mounting configurations. With a high laser-induced damage threshold (LIDT) and resistance to “grey fog” 效应 caused by high-energy 193nm laser irradiation, it ensures long-term stable operation in demanding deep UV laser environments, reducing maintenance costs and downtime for critical industrial systems.

The 193nm Fused Silica Window exhibits excellent thermal stability with a low thermal expansion coefficient (0.5×10⁻⁶/°C), minimizing dimensional changes under temperature fluctuations and ensuring optical performance stability in high-temperature industrial environments. We offer optional anti-reflection (AR) coatings optimized for 193nm wavelength, reducing surface reflection loss to below 1% per surface and further enhancing overall transmittance efficiency. Standard window sizes cover a range of diameters and thicknesses suitable for semiconductor lithography tools and laser systems, and fully custom dimensions, apertures and mounting designs are available to meet specific application requirements. 

The material is also highly resistant to chemical corrosion and UV degradation, ensuring long operational lifetimes exceeding 20 years in controlled environments.

Ultraopto’s 193nm Fused Silica Window is widely applied in cutting-edge deep UV optical fields, including semiconductor lithography for 193nm ArF excimer laser-based photolithography tools, enabling high-resolution patterning of semiconductor wafers for advanced microelectronics manufacturing. In deep UV laser systems, it serves as cavity windows, beam splitters and protective covers, withstanding high-energy laser irradiation while maintaining optical performance. In scientific research, the window is used in deep UV spectroscopy and laser-based experiments requiring precise 193nm wavelength control, while in industrial quality control, it enables high-precision inspection of semiconductor components and micro-optical devices. Additionally, it is essential in aerospace and defense optical systems requiring deep UV detection and measurement capabilities, withstanding extreme environmental conditions while delivering reliable optical performance.

As a professional manufacturer of 193nm-optimized fused silica optical components, Ultraopto offers fully customized 193nm Fused Silica Window solutions to meet your unique deep UV application requirements. Our experienced R&D and engineering team can tailor the material purity, surface quality, flatness, dimensions and optional AR coatings to match the specific requirements of semiconductor lithography, laser systems or scientific instrumentation. We provide ultra-strict tolerance control for critical parameters such as transmittance, homogeneity and flatness, ensuring compliance with the most demanding industry standards. 

All custom window orders undergo multi-stage strict optical performance testing and quality inspection, including 193nm transmittance measurement, surface quality analysis, laser damage threshold testing and environmental stability verification, with a detailed quality inspection report provided to ensure the final product fully complies with your design specifications and application needs. Backed by advanced 193nm fused silica processing technology, a complete quality control system and stable batch supply capacity, Ultraopto is committed to providing global customers with high-quality 193nm Fused Silica Window products and comprehensive deep UV optical solutions. For more detailed technical parameters, product quotation information or custom design solutions for our Ultraopto 193nm Fused Silica Window, please contact our professional sales and technical team through the official website, and we will provide you with efficient, professional and personalized optical solutions to support the development and production of your high-precision deep UV optical systems.