193nm Mirror

The 193nm reflectors produced by UItraopto Precision Optics Co. Ltd have high reflectivity and high damage threshold. They are suitable for applications in excimer lasers and semiconductors.


We offer customized services for 193nm reflectors, allowing customization of diameter and thickness according to requirements. It is specially designed for high-power excimer laser applications. This reflector is an ideal choice for the most demanding ultraviolet applications. The precise ultraviolet-grade fused quartz substrate provides excellent thermal stability and low wavefront distortion. Excimer laser line reflectors can be customized in different sizes, such as 12.5mm, 25mm, and 50mm diameters. This reflector can provide a design wavelength (DWL) of 193nm or 248nm. The reflector has a 45° incident angle and extremely low polarization dependence.

193nm Mirror




Selection of high-quality base materials: 

Compatible with the requirements of the 193nm UV band Crafted from high-purity UV-grade fused silica substrates, our 248nm Reflector is optimized for the 248nm KrF excimer laser wavelength, featuring excellent UV transmittance and low absorption. The substrate exhibits high thermal conductivity to dissipate heat generated by high-energy laser irradiation, preventing thermal deformation and ensuring stable performance. UV-grade fused silica’s superior mechanical strength and corrosion resistance make it suitable for harsh industrial environments, while its low impurity content minimizes optical absorption and scattering at 248nm. The substrate undergoes strict quality control, With surface roughness controlled below Ra 0.2nm to ensure optimal coating adhesion and reflection performance. Standard substrate dimensions include 50.8mm diameter and 9.65mm thickness, with custom sizes available to match specific system requirements. 


Advanced coating process: 

Enhanced UV reflection and protection performance. Our 248nm Reflector adopts advanced low-loss dielectric coating technology via vacuum evaporation, tailored specifically for 248nm UV wavelength. The multi-layer dielectric coating design achieves reflectivity of >99% for both S-polarized and P-polarized light at 45° incident angle, minimizing energy loss in high-energy laser systems. The coating is ultra-hard and durable, withstanding repeated cleaning and environmental exposure without performance degradation. For enhanced protection, we offer optional anti-fouling coatings to prevent contamination in industrial environments. The coating process ensures uniform film thickness across the entire substrate, with strict quality control to eliminate defects that could reduce laser damage threshold. The back surface is ground to reduce stray light interference, improving overall system performance.


Core performance advantages: Adapted for high-energy UV laser scenarios

Ultraopto’s 248nm Reflector features superior surface quality with a 10-5 scratch-dig rating, ensuring minimal surface defects that could cause laser-induced damage. It boasts an impressive laser-induced damage threshold (LIDT >1 J/cm² @0.1-100ns, 10Hz), capable of withstanding high-energy UV laser pulses without coating degradation or substrate damage. The mirror’s surface flatness is controlled within λ/10 @632.8nm, ensuring precise light reflection without beam distortion. Strict dimensional tolerance control (+0/-0.25mm for diameter, ±0.5mm for thickness) enables seamless integration into standard optical mounts, while edge chamfering (0.38–1.14mm face width, 45°±15°) prevents chipping during installation and handling. The reflector’s wedge is ≤3 arc minutes, minimizing beam deviation in high-precision optical systems.


Full scene application coverage: 

Empowering semiconductor and UV laser industries Our 248nm Reflector is widely applied in cutting-edge industrial and scientific fields. In semiconductor lithography, it serves as a core component in KrF excimer laser systems, directing 248nm laser beams for high-resolution patterning of semiconductor wafers. In high-energy excimer laser systems, it enables precise beam steering and shaping for material processing and scientific research. For UV laser processing equipment, it provides reliable reflection for micro-machining, drilling and cutting of materials such as semiconductors and polymers. The reflector also finds use in UV spectroscopy, environmental monitoring and aerospace optical sensors, providing exceptional performance at 248nm wavelength. Its durability and high laser damage threshold make it ideal for long-term continuous operation in industrial environments.


Customized services: 

Meeting personalized needs As a professional manufacturer of UV laser optical components, Ultraopto offers fully customized 248nm Reflector solutions to meet your unique application requirements. Our experienced R&D team can tailor key parameters including substrate size (diameter and thickness), incident angle (optimized for 45° or custom angles), Coating design (enhanced reflectivity or laser damage threshold) and surface flatness (up to λ/20 @632.8nm). We support custom laser damage threshold optimization for high-power applications and can provide coatings tailored to specific polarization requirements (S-polarized, P-polarized or unpolarized). All custom reflectors undergo multi-stage strict quality inspection. including 193nm reflectivity measurement, LIDT testing, surface quality analysis and dimensional verification, with a detailed quality report provided to ensure compliance with your design specifications.


Quality Assurance and Technical Support: 

Your Trusted Choice Backed by advanced UV optical manufacturing technology and a complete quality control system, Ultraopto ensures stable batch supply and consistent product quality. Our production processes adhere to international UV laser component standards, with each 193nm Reflector subjected to rigorous testing using UV spectrophotometers and laser damage threshold test equipment. We provide professional technical consultation on reflector selection, system integration and cleaning procedures, helping you maximize performance and service life. Whether you need standard products for mass-produced laser systems or custom solutions for cutting-edge lithography equipment, Ultraopto’s 193nm Reflector delivers reliable performance and exceptional value.

For more detailed technical parameters, product quotation information or custom design solutions for our Ultraopto 193nm Reflector, please contact our professional sales and technical team through the official website, and we will provide you with efficient, personalized and professional optical solutions.

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