New product launch: 193nm fused silica window

New Product Launch | UltraOpto 193nm Fused Silica Window - The Preferred Core for Deep Ultraviolet Optics

Focusing on the application needs of deep ultraviolet optics, UltraOpto newly launches the 193nm fused silica window, specially optimized for the 193nm ArF excimer laser band, and it is a core supporting component in the high-end optical field!

Selected deep ultraviolet-grade fused silica substrates with strictly controlled hydroxyl and metal impurity contents. The transmittance at 193nm band is >90%, covering a wide range from 185nm to 2100nm (ultraviolet to near-infrared). It has no laser-induced fluorescence and an extremely high laser damage threshold, fundamentally avoiding light absorption and fluorescence interference.

Laser-grade ultra-high precision processing: surface finish reaches 10/5 ~ 20/10, transmitted wavefront distortion ≤λ/[email protected], parallelism ≤5 arcsec, excellent refractive index uniformity, ensuring no distortion in beam transmission; extremely low thermal expansion coefficient, resistant to extreme temperature changes, Mohs hardness 7, resistant to strong acids and plasma erosion, suitable for various harsh working environments.

Supports two options: uncoated / 193nm narrow-band anti-reflection coating. The reflectivity of the anti-reflection coating band is <0.5%, further reducing transmission loss; personalized customization of size, thickness and processing precision is available, to meet the assembly needs of different scenarios in one stop.

Perfectly suitable for high-end fields such as semiconductor lithography, deep ultraviolet laser micromachining/etching, deep ultraviolet spectral detection, and quantum optics experiments. It provides high-stability and low-loss beam transmission and optical path protection for precision optical equipment, making it a high-performance choice for deep ultraviolet optical applications!

📩 Inquire to obtain detailed specifications / apply for samples, enjoy one-on-one technical selection support, and unlock a new experience in deep ultraviolet optical applications!